Ayumi Masada

→ Search for Ayumi Masada in Google Scholar

Speaker, Author, Co-Author

Thu. Sep 15, 2016 1:15 PM - 6:45 PM A23 (201B)

Oral presentation
| 15 Crystal Engineering
| 15.8 Crystal evaluation, impurities and crystal defects

[15p-A23-1~20] 15.8 Crystal evaluation, impurities and crystal defects

2:15 PM - 2:30 PM

[15p-A23-5] Characteristics of Carbon Cluster Ion Implanted Epitaxial Silicon Wafers(1)
-The influence of oxygen concentration in implanted region on gettering of metallic impurities-

〇Ayumi Masada¹, Toshiro Nakai¹, Ryo Hirose¹, Takeshi Kadono¹, Ryosuke Okuyama¹, Yoshihiro Koga¹, Hidehiko Okuda¹, Kazunari Kurita¹ (1.SUMCO)