Akira Heya

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Speaker, Author, Co-Author

Fri. Sep 16, 2016 9:30 AM - 11:30 AM P4 (Exhibition Hall)

Poster presentation
| 13 Semiconductors
| 13.3 Insulator technology

[16a-P4-1~8] 13.3 Insulator technology

9:30 AM - 11:30 AM

[16a-P4-8] Fabrication of AlO_x/GeO_x/Ge Gate Stack Structure by Two Step Thermal Treatment

〇Akira Heya¹, Naoki Yoshioka¹, Naoto Matsuo¹ (1.Univ. of Hyogo)