[13a-B9-1~11] 8.4 Plasma etching

△ [13a-B9-2] Phase-resolved interelectrode distribution of electron density in afterglow of synchronized dc imposed pulsed plasmas for advance dielectric etching processes

〇Toshinari Ueyama¹, Manabu Iwata², Yusuke Fukunaga¹, Takayoshi Tsutsumi¹, Keigo Takeda¹, Hiroki Kondo¹, Kenji Ishikawa¹, Makoto Sekine¹, Yoshinobu Ohya², Masaru Hori¹, Hideo Sugai³ (1.Nagoya Univ., 2.Tokyo Electron MIyagi Ltd., 3.Chubu Univ.)

Keywords:etching, plasma, diagnostics