The 77th JSAP Autumn Meeting, 2016

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7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[13a-D61-1~12] 7.3 Micro/Nano patterning and fabrication

Tue. Sep 13, 2016 9:00 AM - 12:15 PM D61 (Bandaijima Bldg.)

Toshiyuki Horiuchi(Tokyo Denki Univ.), Yoshihiko Hirai(Osaka Pref. Univ.), Jun Taniguchi(Tokyo Univ. of Sci.), Hiroaki Oizumi(GIGAPHOTON)

11:45 AM - 12:00 PM

[13a-D61-11] Computational study of material optimization on de-molding process in nanoimprint lithography

Florian Chalvin1,2, Masaaki Yasuda1, Hiroaki Kawata1, 〇Yoshihiko Hirai1 (1.Osaka Pref. Univ., 2.Ecole Nat. Sup. Elec. Appl.)

Keywords:nanoimprint, de-molding, material property

Optimization of mold mechanical property has been studied by computational work in nanoimprint lithography