The 77th JSAP Autumn Meeting, 2016

Presentation information

Print

Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[13a-D61-1~12] 7.3 Micro/Nano patterning and fabrication

Tue. Sep 13, 2016 9:00 AM - 12:15 PM D61 (Bandaijima Bldg.)

Toshiyuki Horiuchi(Tokyo Denki Univ.), Yoshihiko Hirai(Osaka Pref. Univ.), Jun Taniguchi(Tokyo Univ. of Sci.), Hiroaki Oizumi(GIGAPHOTON)

12:00 PM - 12:15 PM

[13a-D61-12] The characteristics of repeated transfer durability in the UV-NIL using a release agent-free replica mold

〇Jun Taniguchi1, Gen Nakagawa1, Shin Hiwasa2 (1.Tokyo Univ. of Sci., 2.Autex)

Keywords:nanoimprint, replica mold, release agent

The repetition transfer characteristics of Ultraviolet nanoimprint lithography was examined using release coating free replica mold. This replica molds was made of UV curable resin which includes release coating material. Thus, this replica mold can use to transfer for UV-NIL without release coating. The repetition transfer characteristics were measured by contact angle and error rate. As a results, the fabricated replica mold can transfer up to 1200 times.