Effect of Width and Number of Slits in Faraday Shield on the Performance of Inductively Coupled Plasma

Presentation information

Oral presentation

8 Plasma Electronics » 8.8 Plasma Electronics English Session

Tue. Sep 13, 2016 2:45 PM - 4:15 PM A41 (Int'l Conf. Room)

Koichi Sasaki(Hokkaido Univ.)

2:45 PM - 3:00 PM

〇(M1)Makato Moriyama¹, Daisuke Ogawa¹, Ivan Ganachev^1,2, Keiji Nakamura¹ (1.Chubu Univ., 2.Shibaura Mechatronics)

Keywords:Plasma Processing, Inductively coupled plasma