Electric field induced change of the crystal structure in YO<sub>1.5</sub>-HfO<sub>2 </sub>thin film

Takao Shimizu; Takanori Mimura; Kiliha Katayama; Takanori Kiguchi; Akihiro Akama; Toyohiko Konno; Osami Sakata; Hiroshi Funakubo

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.1 Ferroelectric thin films

[14a-A23-1~10] 6.1 Ferroelectric thin films

Wed. Sep 14, 2016 9:00 AM - 11:45 AM A23 (201B)

Shinya Yoshida(Tohoku Univ.), Tomoaki Yamada(Nagoya Univ.)

9:45 AM - 10:00 AM

[14a-A23-4] Electric field induced change of the crystal structure in YO_1.5-HfO₂thin film

〇Takao Shimizu¹, Takanori Mimura¹, Kiliha Katayama¹, Takanori Kiguchi², Akihiro Akama², Toyohiko Konno², Osami Sakata³, Hiroshi Funakubo¹ (1.Tokyo Inst. Tech., 2.Tohoku Univ., 3.NIMS)

Keywords:ferroelectrics, Hafnium oxide, Micro area X-ray diffraction

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Presentation information

[14a-A23-1~10] 6.1 Ferroelectric thin films

[14a-A23-4] Electric field induced change of the crystal structure in YO1.5-HfO2 thin film

[14a-A23-4] Electric field induced change of the crystal structure in YO_1.5-HfO₂thin film