Tailoring the crystal structure of TiO<sub>2</sub> films deposited by reactive sputtering (2);<br />Selective anatase growth by Nb or N dopings

Hiroyoshi Nishiyama; Junjun Jia; Shin-ichi Nakamura; Toshihiro Okajima; Masaaki Imura; Toshimasa Kanai; Yuzo Shigesato

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[14p-A31-1~16] 6.3 Oxide electronics

Wed. Sep 14, 2016 1:30 PM - 5:45 PM A31 (302A)

Kouhei Yoshimatsu(Titech), Yuji Muraoka(Okayama Univ.)

2:30 PM - 2:45 PM

[14p-A31-5] Tailoring the crystal structure of TiO₂ films deposited by reactive sputtering (2);
Selective anatase growth by Nb or N dopings

〇Hiroyoshi Nishiyama¹, Junjun Jia¹, Shin-ichi Nakamura¹, Toshihiro Okajima², Masaaki Imura³, Toshimasa Kanai³, Yuzo Shigesato¹ (1.Aoyama Gakuin Univ, 2.kyushu Synchrotron Light Research Center, 3.Nippon Electric Glass Co., Ltd.)

Keywords:TiO2

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Presentation information

[14p-A31-1~16] 6.3 Oxide electronics

[14p-A31-5] Tailoring the crystal structure of TiO2 films deposited by reactive sputtering (2);Selective anatase growth by Nb or N dopings

[14p-A31-5] Tailoring the crystal structure of TiO₂ films deposited by reactive sputtering (2);
Selective anatase growth by Nb or N dopings