[15a-B10-1~13] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[15a-B10-1] Study on the Si deposition process in Atmospheric-Pressure Plasma for application to low-temperature thin film transistors

〇Shogo Tamaki¹, Koji Terawaki¹, Yuichiro Kimoto¹, Kohei Kamada¹, Hiromasa Ohmi¹, Hiroaki Kakiuchi¹, Kiyoshi Yasutake¹ (1.Graduate School of Engineering, Osaka University)

Keywords:plasma-enhanced chemical vapor deposition, atmospheric-pressure, silicon