Inner Potential Distribution and Interface Dipoles in HfO<sub>2</sub>/SiO<sub>2</sub>/Si(100) Structure as Evaluated by XPS

Presentation information

Oral presentation

13 Semiconductors » 13.3 Insulator technology

Thu. Sep 15, 2016 10:15 AM - 11:45 AM B9 (Exhibition Hall)

11:00 AM - 11:15 AM

〇Nobuyuki Fujimura¹, Akio Ohta¹, Mitsuhisa Ikeda¹, Katsunori Makihara¹, Seiichi Miyazaki¹ (1.Nagoya Univ.)

Keywords:XPS, Inner Potential Change, Interface Dipole