Direct Patterning of Zinc Oxide Semiconductors using Cyclo Olefin Polymer by Nanoimprint Method

Abdullah Alhanaki; Fumiya Kimura; Kouki Nagayama; Kouhei Ashida; Yi Sun; Masatoshi Koyama; Toshihiko Maemoto; Shigehiko Sasa

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Joint Session K "Wide bandgap oxide semiconductor materials and devices" » Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[15p-A22-1~17] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Thu. Sep 15, 2016 1:30 PM - 6:00 PM A22 (Main Hall B)

Yasuaki Ishikawa(NAIST), Mamoru Furuta(Kochi Univ. of Tech.)

5:00 PM - 5:15 PM

[15p-A22-14] Direct Patterning of Zinc Oxide Semiconductors using Cyclo Olefin Polymer by Nanoimprint Method

〇Abdullah Alhanaki¹, Fumiya Kimura¹, Kouki Nagayama¹, Kouhei Ashida¹, Yi Sun¹, Masatoshi Koyama¹, Toshihiko Maemoto¹, Shigehiko Sasa¹ (1.Osaka Inst. of Tech. NMRC)

Keywords:Nanoimprint, Zinc oxide

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