[15p-P6-1~16] 8.3 deposition of thin film and surface treatment

△ [15p-P6-2] Heat influx to substrate in high power impulse magnetron sputtering

〇Katsuhiro Hattori¹, Takayuki Ohta¹, Akinori Oda², Hiroyuki Kousaka³ (1.Meijo Univ., 2.Chiba Inst. Tech., 3.Nagoya Univ.)

Keywords:Substrate temperature measurement, HiPIMS, Heat influx to substrate