[15p-P6-1~16] 8.3 deposition of thin film and surface treatment

[15p-P6-4] Low-temperature Deposition of Nitride Thin Films with Plasma Enhanced Reactive DC Pulsed Magnetron Sputtering

〇Kosuke Takenaka¹, Yoshikatsu Satake¹, Giichiro Uchida¹, Yuichi Setsuhara¹ (1.Osaka Univ.)

Keywords:AlN, reacive sputtering, plasma-enhanced sputtering