[16p-B10-1~12] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[16p-B10-4] Half-Inch Silicon CVD Reactor Using Concentrated Infrared Light Heater (7)

〇NING LI¹, MIYA MATSUO¹, HITOSHI HABUKA¹, TAKANORI MIKAHARA², SHIN-ICHI IKEDA^2,3, YUUKI ISHIDA^2,3, SHIRO HARA^2,3 (1.Yokohama National Univ., 2.MINIMAL, 3.AIST)

Keywords:Minimal manufacturing, Silicon epitaxy, Thermal transport

The thermal transport in the chemical vapor deposition reactor for the Minimal Manufacturing was analyzed using the numerical calculation. The inlet gas velocity governs the entire gas flow. The wafer rotation also has a considerable influence on the gas phase temperature.