The 77th JSAP Autumn Meeting, 2016

Presentation information

Print

Oral presentation

8 Plasma Electronics » 8.3 deposition of thin film and surface treatment

[16p-B7-1~13] 8.3 deposition of thin film and surface treatment

Fri. Sep 16, 2016 1:15 PM - 4:45 PM B7 (Exhibition Hall)

Kazunori Koga(Kyushu Univ.), Keiji Nakamura(Chubu Univ.)

2:00 PM - 2:15 PM

[16p-B7-4] SiO2 Film Deposition by O2/TEOS Slot Type Microwave Plasma CVD

〇Masaki Yamamoto1, Haruka Suzuki1, Hirotaka Toyoda1,2 (1.Nagoya Univ., 2.PLANT, Nagoya Univ.)

Keywords:Plasma CVD, Microwave Plasma