Hiroyuki Tanaka

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Speaker, Author, Co-Author

Sat. Mar 19, 2016 9:00 AM - 12:30 PM S423 (S4)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[19a-S423-1~13] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

11:45 AM - 12:00 PM

[19a-S423-11] Techniques to improve the etching pattern resolution with high-speed gas-switching Bosch process and minimal multiple exposure process

〇Hiroyuki Tanaka^1,2, Hisato Ogiso^1,2, Shizuka Nakano^1,2, Toshiyasu Hayami^2,3, Toshiya Miyazaki^2,3, Ryoichi Irita^2,4, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL, 3.SPPT, 4.PMT)

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