kazushige sato

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Speaker, Author, Co-Author

Sat. Mar 19, 2016 9:00 AM - 12:30 PM S423 (S4)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[19a-S423-1~13] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

10:00 AM - 10:15 AM

[19a-S423-5] Study of uniformity on thermal oxide on a wafer formed by a minimal laser heating furnace

〇kazushige sato¹, Haruki Toonoe¹, Takashi Chiba^1,3, Masao Terada^1,3, Shinichi Ikeda^1,2, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.Minimal Fab Development Association, 2.AIST, 3.Sakaguchi E.H VOC Corp)

10:15 AM - 10:30 AM

[19a-S423-6] Heating characteristics of the minimal furnace that can irradiate laser from the backside of a wafer

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