Tomonori Nishimura

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Speaker, Author, Co-Author

Sat. Mar 19, 2016 1:45 PM - 6:15 PM S423 (S4)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[19p-S423-1~17] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

4:15 PM - 4:30 PM

[19p-S423-10] Alleviation of Fermi Level Pinning at Metal/Germanium Interface Based on Control of Interfacial Dipole Density

〇Tomonori Nishimura¹, Takeaki Yajima¹, Akira Toriumi¹ (1.The Univ. of Tokyo)