Naoya Okada

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Speaker, Author, Co-Author

Sat. Mar 19, 2016 1:45 PM - 6:15 PM S423 (S4)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[19p-S423-1~17] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

4:45 PM - 5:00 PM

[19p-S423-12] Characterization of W-silicide films composed of W-encapsulating Si clusters deposited using gas-phase reactions of WF₆ with SiH₄

〇Naoya Okada^1,2, Noriyuki Uchida², Toshihiko Kanayama² (1.JST-PRESTO, 2.AIST)