Shuichi Noda

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Speaker, Author, Co-Author

Sat. Mar 19, 2016 1:45 PM - 6:15 PM S423 (S4)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[19p-S423-1~17] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

5:30 PM - 5:45 PM

[19p-S423-15] Germanium Fin Transistor Channel Formation using Chlorine Neutral Beam

En-Tzu Lee¹, 〇Shuichi Noda¹, Wataru Mizubayashi², Kazuhiko Endo², Seiji Samukawa^1,2 (1.Tohoku Univ., 2.AIST)