TAKESHI KADONO

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Speaker, Author, Co-Author

Sun. Mar 20, 2016 2:15 PM - 5:45 PM H113 (H)

Oral presentation
| 15 Crystal Engineering
| 15.8 Crystal evaluation, impurities and crystal defects

[20p-H113-1~13] 15.8 Crystal evaluation, impurities and crystal defects

3:15 PM - 3:30 PM

△ [20p-H113-5] Characteristic of Carbon Cluster Ion Implanted Epitaxial Silicon Wafers (5)
- Impact of Carbon Cluster Ion Implanted Projected Range using by Microwave heat treatment -

〇TAKESHI KADONO¹, RYOSUKE OKUYAMA¹, AYUMI MASADA¹, RYOU HIROSE¹, YOSHIHIRO KOGA¹, HIDEHIKO OKUDA¹, KAZUNARI KURITA¹ (1.SUMCO CORPORATION)