Atsushi Hiraiwa

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Speaker, Author, Co-Author

Sun. Mar 20, 2016 1:45 PM - 6:15 PM S221 (S2)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[20p-S221-1~17] 13.3 Insulator technology

2:30 PM - 2:45 PM

[20p-S221-4] Electric characteristics of Al₂O₃ films formed at different ALD temperatures

〇Atsushi Hiraiwa¹, Daisuke Matsumura², Hiroshi Kawarada^1,2 (1.Waseda Univ., RONL, 2.Waseda Univ., FSE)