Koji Yoshitsugu

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Speaker, Author, Co-Author

Sun. Mar 20, 2016 1:45 PM - 6:15 PM S221 (S2)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[20p-S221-1~17] 13.3 Insulator technology

2:45 PM - 3:00 PM

△ [20p-S221-5] Fabrication of Al₂O₃ Dielectric Film Grown by Atomic Layer Deposition with DMAH

〇Koji Yoshitsugu¹, Ishikawa Yasuaki¹, Kiyoshi Takahashi², Uraoka Yukiharu¹ (1.NAIST, 2.Nippon Aluminum Alkyls, Ltd.)