Yoshiaki Nieda

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Speaker, Author, Co-Author

Sun. Mar 20, 2016 1:45 PM - 6:45 PM S423 (S4)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[20p-S423-1~19] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

3:00 PM - 3:15 PM

[20p-S423-6] (100) Oriented Crystallization of Silicon Film by CW Laser Annealing on Amorphous Substrate

〇(M2)Yoshiaki Nieda¹, Nobuo Sasaki², Daisuke Hishitani¹, Masahiro Horita³, Yasuaki Ishikawa¹, Yukiharu Uraoka¹ (1.Nara Inst. of Sci. and Tech., 2.Japan Women's Univ., 3.Kyoto Univ.)

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