Nozomu Iitsuka

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Speaker, Author, Co-Author

Mon. Mar 21, 2016 9:00 AM - 12:00 PM H101 (H)

Oral presentation
| 15 Crystal Engineering
| 15.6 Group IV Compound Semiconductors (SiC)

[21a-H101-1~11] 15.6 Group IV Compound Semiconductors (SiC)

10:15 AM - 10:30 AM

[21a-H101-6] Roughness Growth during Step-Etching on Thermal Oxide Surface of SiC

Ryu Nagai¹, 〇Nozomu Iitsuka¹, Ryu Hasunuma¹, Kikuo Yamabe¹ (1.Univ. of Tsukuba)