Eiichiro Nishimura

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Speaker, Author, Co-Author

Mon. Mar 21, 2016 1:15 PM - 7:00 PM H103 (H)

Oral presentation
| 6 Thin Films and Surfaces
| 6.4 Thin films and New materials

[21p-H103-1~21] 6.4 Thin films and New materials

3:30 PM - 3:45 PM

[21p-H103-9] Properties of In-Ga-O semiconductor thin film deposited by sputtering with H₂O introduction

〇Eiichiro Nishimura¹, Toshio Morimoto¹, Tokuyuki Nakayama¹, Fumihiko Matsumura¹, Mana Shiraki¹, Kousaku Shimizu², Yuhki Ohno², Satoru Tanaka² (1.SUMITOMO METAL MINING CO., LTD., 2.Nihon University)