kazuki kamimura

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Speaker, Author, Co-Author

Mon. Mar 21, 2016 4:00 PM - 6:00 PM P17 (Gymnasium)

Poster presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[21p-P17-1~26] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

4:00 PM - 6:00 PM

[21p-P17-8] Development of heat treatment technology for formation of Nickel Silicide electrode of Si-ULSI

〇kazuki kamimura¹, hiroki nakaie¹, tetsuji arai¹, chiaya yamamoto¹, keisuke arimoto¹, junji yamanaka¹, kiyokazu nakagawa¹, toshiyuki takamatsu² (1.Univ. of Yamanashi, 2.SST Inc.)

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