Kimio Kinoshita

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Speaker, Author, Co-Author

Mon. Mar 21, 2016 1:30 PM - 6:15 PM S222 (S2)

Symposium
| Symposium
| Advanced Fabrication System for Metal Oixde Thin Films

[21p-S222-1~9] Advanced Fabrication System for Metal Oixde Thin Films

3:30 PM - 4:00 PM

[21p-S222-5] Reactive Plasma Deposition (RPD) equipment

〇Kimio Kinoshita¹, Makoto Maehara¹, Toshiyuki Sakemi¹, Hisashi Kitami¹ (1.Sumitomo Heavy Industries)