Symposium
Symposium » Advanced Fabrication System for Metal Oixde Thin Films
Mon. Mar 21, 2016 1:30 PM - 6:15 PM S222 (S2)
Tetsuya Yamamoto(Kochi Univ. of Tech.), Akira Ohtomo(Titech)
1:30 PM - 2:00 PM
〇Masashi KAWASAKI1,2 (1.Univ Tokyo, 2.RIKEN CEMS)
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2:00 PM - 2:30 PM
〇Yasufumi Fujiwara1 (1.Osaka Univ.)
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2:30 PM - 3:00 PM
〇Housei Akazawa1 (1.NTT DIC)
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3:00 PM - 3:30 PM
〇Koichi Suzuki1 (1.SFT)
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3:30 PM - 4:00 PM
〇Kimio Kinoshita1, Makoto Maehara1, Toshiyuki Sakemi1, Hisashi Kitami1 (1.Sumitomo Heavy Industries)
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4:15 PM - 4:45 PM
〇Norifumi Fujimura1, Yukinori Nose1, Takuya Kiguchi1, Tsuyoshi Uehara2, Takeshi Yoshimura1, Atsushi Ashida1 (1.Graduate School of Engineering, 2.Sekisui Chemical Co.)
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4:45 PM - 5:15 PM
〇Takashi Yasuda1 (1.ISU)
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5:15 PM - 5:45 PM
〇Toshihide Nabatame1 (1.NIMS)
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5:45 PM - 6:15 PM
〇Atsushi Tsukazaki1,2 (1.IMR, Tohoku Univ., 2.JST-PRESTO)
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