Norifumi Fujimura

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Speaker, Author, Co-Author

Mon. Mar 21, 2016 1:30 PM - 6:15 PM S222 (S2)

Symposium
| Symposium
| Advanced Fabrication System for Metal Oixde Thin Films

[21p-S222-1~9] Advanced Fabrication System for Metal Oixde Thin Films

4:15 PM - 4:45 PM

[21p-S222-6] Novel chemical vapor deposition process of oxide thin films using nonequilibrium plasma generated near atmospheric pressure

〇Norifumi Fujimura¹, Yukinori Nose¹, Takuya Kiguchi¹, Tsuyoshi Uehara², Takeshi Yoshimura¹, Atsushi Ashida¹ (1.Graduate School of Engineering, 2.Sekisui Chemical Co.)

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