Masashi Yamamoto

→ Search for Masashi Yamamoto in Google Scholar

Speaker, Author, Co-Author

Tue. Mar 22, 2016 9:00 AM - 12:45 PM W611 (W6)

Oral presentation
| 8 Plasma Electronics
| 8.3 Deposition of thin film and surface treatment

[22a-W611-1~14] 8.3 Deposition of thin film and surface treatment

11:00 AM - 11:15 AM

[22a-W611-8] Photoresist removal using atmospheric pressure low-temperature plasma

Tomoki Takai¹, 〇Masashi Yamamoto¹, Tomokazu Shikama¹, Shiro Nagaoka¹, Takashi Nishiyama², Hideo Horibe² (1.NIT, Kagawa College, 2.Osaka City Univ.)

11:15 AM - 11:30 AM

△ [22a-W611-9] Oxygen additive amount dependence of photoresist removal rate by hydrogen radical

〇Masashi Yamamoto¹, Hironobu Umemoto², Keisuke Ohdaira³, Tomokazu Shikama¹, Takashi Nishiyama⁴, Hideo Horibe⁴ (1.NIT, Kagawa College, 2.Shizuoka Univ., 3.JAIST, 4.Osaka City Univ.)

▲