[19p-P6-1~8] 8.3 Deposition of thin film and surface treatment

[19p-P6-2] Preparation of AZO films without Substrate Heating by RF Magnetized Plasma Sputtering with Cylindrical Target

〇Yasunori Ohtsu¹, Takashi Sumiyama¹, Mai Yamaguchi¹, Tatsuo Tabaru², Taisei Motomura² (1.Saga Univ., 2.AIST)

Keywords:Transparent conductive oxide film,facing target sputtering

In this work, a novel RF magnetized plasma sputtering source, where two cylindrical targets with different diameter are faced and magnets are mounted outside their target so as to produce high-density plasma between two targets, has been developed for preparation of high-quality AZO thin films without substrate heating. The deposited AZO thin films have a volume resistivity with an order of magnitude of 10^-3 ohm cm. The uniform profile of the volume resistivity in AZO thin films is attained compared with that deposited by conventional planar magnetron plasma sputtering.