[19p-S223-1~10] 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

[19p-S223-10] Particle removal efficiency evaluation of filters in 70 ℃ diluted hydrochloric acid

〇Tomoyuki Takakura¹, Shuichi Tsuzuki¹ (1.Nihon Pall Ltd.)

Keywords:filter,semiconductor,filtration

As a part of filter performance evaluation in the chemicals used for semiconductor device cleaning processes, we investigated filters’ particle removal efficiency in 70 deg. C pH1 HCl. The test filters were 10 inch cartridge filters made of 10-nm-rating surface-modified PTFE and Highly Asymmetric Polyarylsulfone (HAPAS) membranes. The results showed that the filters effectively removed particles in the chemical.