4:00 PM - 4:15 PM
[19p-S224-10] Study on stress relaxation in thermal nanoimprint lithography
Keywords:nanoimprint,stress relaxation,ordering
Presentation information
Oral presentation
7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication
[19p-S224-1~17] 7.3 Micro/Nano patterning and fabrication
Sat. Mar 19, 2016 1:30 PM - 6:00 PM S224 (S2)
Makoto Okada(Univ. of Hyogo), Atsushi Yokoo(NTT)