[19p-S224-1~17] 7.3 Micro/Nano patterning and fabrication

[19p-S224-3] Directed self-assembly of polystyrene-block-poly(methyl methacrylate) in sub-100 nm-wide resin trenches fabricated using UV-nanoimprinting

〇(B)Tetsuhisa Kanahara¹, Ryo Okubo¹, Nobuya Hiroshiba¹, Masaru Nakagawa¹ (1.IMRAM, Tohoku Univ.)

Keywords:directed self-assembly

We have studied directed self-assembly (DSA) of block copolymers in Si trenches fabricated using UV-nanoimprint lithography. According to the fluid simulation by Yoshimoto et al. (Kyoto University), it is expected that trench widths and depths have a significant effect on microphase-separated structure of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA). A resin trench fabricated using UV-nanoimprinting (UVN) is known for the small surface roughness. In this study, we used resin trenches fabricated using UVN as DSA guides and investigated dependence of microphase-separated structure of PS-b-PMMA on resin trenches with the width range of 45-100 nm.