The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

15 Crystal Engineering » 15.8 Crystal evaluation, impurities and crystal defects

[20a-H113-1~12] 15.8 Crystal evaluation, impurities and crystal defects

Sun. Mar 20, 2016 9:30 AM - 12:45 PM H113 (H)

Kentaro Kutsukake(Tohoku Univ.), Yuta Nagai(GlobalWafers Japan)

10:00 AM - 10:15 AM

[20a-H113-3] Comments on the Voronkov model (2): Effects of impurities

Masashi Suezawa1, Yoshiaki Iijima1, Ichiro Yonenaga1 (1.I.M.R.,Tohoku Univ.)

Keywords:Voronkov model,impurity effect,growth velocity

Vorokov and Falster discuss the effects of impurities on the grown-in defects in silicon under the assumption that the concentration of vacancy depends on the dopant concentration. According to our quenching experiments, however, the vacancy formation energy strongly depends othe species of dopants. We discuss the effect of dopant on the crystal growth velocity based on stage 1 shown in the previous presentation.