[20a-KD-1~5] 8.2 Plasma measurements and diagnostics

△ [20a-KD-4] High accuracy temperature measurement of silicon substrate in high-powert impulse magnetron sputtering process using low-coherence interferometry

〇(M1)Katsuhiro Hattori¹, Takayuki Ohta¹, Akinori Oda², Hiroyuki Kousaka³ (1.Meijo Univ., 2.Chiba Inst. Tech., 3.Nagoya Univ.)

Keywords:Substrate temperature measurement,Low-coherence interferometry,sputtering