[20a-S224-1~9] 7.3 Micro/Nano patterning and fabrication

[20a-S224-6] Computational study on novel photolithography on deep stepped substrate by Built-in lens mask lithography

〇Toshiki Tanaka¹, Masaru Sasago¹, Hisao Kikuta¹, Hiroaki Kawata¹, Yoshikhiko Hirai¹ (1.Osaka Pref. Univ.)

Keywords:photolithography,photomask,3D