[20p-W621-1~7] Gas Flow Analysis in Vacuum and Low-Pressure Processing

[20p-W621-1] Introductory talk: Analysis of Gas Flow for Vacuum Processing

〇Hajime Yoshida¹, Akiko Itakura² (1.AIST, 2.NIMS)

Keywords:Vacuum,Gas flow

Analyzing gas flow and pressure distribution in a process chamber is important to understand processes of physical/chemical reactions for vacuum processing. In this symposium, speakers who belong to universities and private companies talks about methods of both analysis and simulation corresponding to characteristics of the gas flow. A new pressure sensor to measure pressure distribution in a chamber is also presented.