The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[21a-H121-1~11] 15.4 III-V-group nitride crystals

Mon. Mar 21, 2016 8:45 AM - 11:45 AM H121 (H)

Motoaki Iwaya(Meijo Univ.), Makoto Saito(Tohoku Univ.)

10:30 AM - 10:45 AM

[21a-H121-7] Effect of crystal plane of sapphire seed crystal on solution growth of AlN using Cr-Ni solvent

Shinichiro Kurosaka1, Taka Narumi1, Sakiko Kawanishi2,3, Sasaki Hideaki2, Takeshi Yoshikawa2, Masafumi Maeda2 (1.Univ. of Tokyo, 2.IIS, Univ. of Tokyo, 3.IMRAM, Tohoku Univ.)

Keywords:aluminum nitride,solution growth

AlN single crystal is expected to be a base material of deep-UV light emitting diode, and we were aiming for rapid growth at low temperature by a solution growth method using Cr-Ni solvent, which had large solubility of AlN. In this report, solution growth was conducted by a temperature difference method using c-plane, a-plane, r-plane and AlN-coated sapphire for a seed substrate. In conclusion, the growth rate at every seed substrates was higher than reported highest growth rates using Cu-Al solvent.