The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

13 Semiconductors » 13.8 Compound and power electron devices and process technology

[21a-W541-1~12] 13.8 Compound and power electron devices and process technology

Mon. Mar 21, 2016 9:00 AM - 12:15 PM W541 (W5)

Tetsuya Suemitsu(Tohoku Univ.)

9:45 AM - 10:00 AM

[21a-W541-4] Mapping of Ag/n-GaN Schottky contacts fabricated by printing of Ag nanoink (2)

Masato Shingo1, Takafumi Ito1, Yukiyasu Kashiwagi2, Tasuku Shigemune3, Atsushi Koizumi3, Takanori Kojima3, Masashi Saitoh2, Kimihiro Matsukawa2, Yasufumi Fujiwara3, Kenji Shiojima1 (1.Univ. of Fukui, 2.Osaka Munic. Tech. Res. Inst., 3.Osaka Univ.)

Keywords:scanning internal photoemission microscopy,Ag nanoink,Schottky contact

We demonstrated scanning internal photoemission microscopy (SIPM) to characterize printed Ag electrodes in an initial stage of electrode formation. When Ag nano-ink was printed once, the ink dispersed into isolated small portions. When the printing was conducted more than three times, the small portions were connected each other. SIPM was clearly visualized such Ag/n-GaN interface.