The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.2 Applications and technologies of electron beams

[21p-H137-1~22] 7.2 Applications and technologies of electron beams

Mon. Mar 21, 2016 1:15 PM - 7:00 PM H137 (H)

Yoichiro Neo(Shizuoka Univ.), Hitoshi Nakahara(Nagoya Univ.), Yasuhito Gotoh(Kyoto Univ.)

5:45 PM - 6:00 PM

[21p-H137-18] Dependence of the working distance and the applied bias on the surface potential distribution of insulating specimen irradiated by electron beam

〇(M1)Masasi Tokai1, Takuya Kawamoto1, Masatoshi Kotera1 (1.Osaka Inst.)

Keywords:SEM,EB