The 63rd JSAP Spring Meeting, 2016

Presentation information

Poster presentation

13 Semiconductors » 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[21p-P17-1~26] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

Mon. Mar 21, 2016 4:00 PM - 6:00 PM P17 (Gymnasium)

4:00 PM - 6:00 PM

[21p-P17-9] Electrical Characteristics of Al foil/Si junctions by surface activated bonding method

Katsuya Furuna1, Jianbo Liang1, Moeko Matsubara2, Yoshitaka Nishio2, Naoteru Shigekawa1 (1.Osaka City Univ., 2.Toyo Aluminium K.K.)

Keywords:surface activated bonding method,Al foil,Si

表面活性化ボンディング法により作成したAl foil/p-Si接合の電気特性評価による厚膜電極実現可能性の検証。