[21p-P17-1~26] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[21p-P17-10] Mn diffusion into porous SiOCH during CVD formation of a MnO_x diffusion barrier layer

〇Hiroyuki Koide¹, Hao Wang¹, Daisuke Ando¹, Yuji Sutou¹, Junichi Koike¹ (1.Tohoku Univ.)

Keywords:diffusion barrier,CVD-Mn,porous low-k