[21p-P3-1~21] 6.2 Carbon-based thin films

[21p-P3-8] Insertion of Si thin film on Silicon substrate for the Growth of Polycrystalline Diamond with Microwave Plasma-enhanced Chemical Vapor Deposition

〇Takeo Furuhata¹, Tomohiro Shinagawa¹, Hiroya Yamarin¹, Keisuke Nakamura¹, Hideaki Yamada², Mikio Yamamuka¹ (1.Mitsubishi Electric Corp., 2.AIST)

Keywords:diamond,plasma enhanced chemical vapor deposition