The 63rd JSAP Spring Meeting, 2016

Presentation information

Symposium

Symposium » Advanced Fabrication System for Metal Oixde Thin Films

[21p-S222-1~9] Advanced Fabrication System for Metal Oixde Thin Films

Mon. Mar 21, 2016 1:30 PM - 6:15 PM S222 (S2)

Tetsuya Yamamoto(Kochi Univ. of Tech.), Akira Ohtomo(Titech)

3:00 PM - 3:30 PM

[21p-S222-4] Latest trend of sputtering technologies in Germany

Koichi Suzuki1 (1.SFT)

Keywords:Pulsed sputtering,Fraunhofer FEP,Fraunhofer IST

As the latest trend of sputtering technologies of Fraunhofer FEP and IST, which are known with the development of advanced PVD technologies, RM cathode for precision optics/low temperature/low damage coating, high power square wave pulsed power supply, spectroscopic process control system and their application for transparent gas barrier film of FEP and HPIMS of IST will be introduced.