The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

13 Semiconductors » 13.8 Compound and power electron devices and process technology

[21p-W541-1~12] 13.8 Compound and power electron devices and process technology

Mon. Mar 21, 2016 1:45 PM - 5:00 PM W541 (W5)

Kenji Shiojima(Univ. of Fukui), Kozo Makiyama(Fujitsu Lab.)

4:00 PM - 4:15 PM

[21p-W541-9] Improvement of heat dissipation in a transferred AlGaN/GaN HEMT by using a copper plate with smooth surface

Masanobu Hiroki1, Kazuhide Kumakura1, Hideki Yamamoto1 (1.NTT BRL)

Keywords:AlGaN/GaN,HEMT,epitaxial lift-off

We found the increase in the heat dissipation of AlGaN/GaN HEMT by transfer to copper plate using h-BN epitaxial lift-off technique. In this report, we present that thermal resistance of the HEMT reduced by 25% by using copper plate wtih flat surface. It is probably caused by the improvement of adhesion between GaN layer and a copper plate.