The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

17 Nanocarbon Technology » 17.2 Graphene

[22a-S011-1~16] 17.2 Graphene

Tue. Mar 22, 2016 9:00 AM - 1:15 PM S011 (S0)

Kenzo Maehashi(TUAT)

10:15 AM - 10:30 AM

[22a-S011-6] Influence of Cu crystallographic orientations on graphene anisotropic etching

〇(D)Kamal Prasad Sharma, Golap Kalita1, Masaki Tanemura1 (1.Nagoya Inst. Technol.)

Keywords:Graphene,LP-CVD,Anisotropic etching

Etching process has been established as an important tool to understand the growth of graphene and other 2D materials; as well as enabling fabrication of various well-defined structures. Here, we reveal the influence of Cu crystallographic orientation on graphene anisotropic etching process. Microscopic analysis showed different shape and size of graphene crystals with dissimilar nucleation within closure vicinity of neighboring Cu grains on the basis of Crystallograpic orientaions of Cu with dissimilar anisotropic etching.