[22a-W611-1~14] 8.3 Deposition of thin film and surface treatment

△ [22a-W611-7] Effect of discharge tube material in nitriding of SiC surface using a remote nitrogen plasma

〇masaharu shimabayashi¹, kazuaki kurihara², koichi sasaki¹ (1.Hokkaido Univ., 2.IMEC/Toshiba)

Keywords:SiC,remote nitrogen plasma

We previously reported that SiC surface irradiated by remote nitrogen plasma had a oxidized layer at the top surface. It is speculated that the exposure to air and/or the production of atomic oxygen from the quartz discharge tube are the cases of the oxidation. In this talk, we report the comparison between the SiC surfaces irradiated by remote nitrogen plasmas using quartz and p-BN tube as the discharge tube.