[22p-H103-1~8] 6.4 Thin films and New materials

[22p-H103-2] Fabrication of Manganese Nitride Thin Films by Ultrahigh-Field Sputtering

〇Toshiki Matsumoto¹, Takahiko Kawaguchi¹, Takafumi Hatano¹, Shunta Harada¹, Kazumasa Iida¹, Toru Ujihara¹, Hiroshi Ikuta¹ (1.Nagoya Univ.)

Keywords:sputtering,nitride thin film,antiperovskite